Resist composition, method for manufacturing resist patterns, and salts and resins

Abstract

The purpose of this invention is to provide a salt, resin, and resist composition capable of manufacturing resist patterns with good CD uniformity. A resist composition contains a salt represented by formula (I) or a resin containing a structural unit represented by formula (IP). [In the formula, Q1, Q2, R1, and R2 represent hydrogen atoms, fluorine atoms, perfluoroalkyl groups having 1 to 6 carbon atoms, etc.; z represents any integer from 0 to 6; X0 represents -O-, -CO-, -S-, etc.; mm1 represents 0 or 1; L1 and L2 represent single bonds or substituted / unsubstituted hydrocarbon groups, respectively; W1 represents substituted / unsubstituted alicyclic hydrocarbon groups; A1 represents substituted / unsubstituted hydrocarbon groups; Ar1 ​​represents an aromatic hydrocarbon group having an iodine atom, which may have substituents other than an iodine atom; X1 represents a single bond, -O-, -CO-, etc.; R0 represents a hydrogen atom, a halogen atom, or an alkyl group that may have a halogen atom; mm2 represents an integer from 1 to 5; ZI+ represents an organic cation.]