Methods for manufacturing resist compositions and resist patterns, as well as salts and resins.

Abstract

The object of the present invention is to provide a salt, resin, and resist composition that can produce a resist pattern with good CD uniformity. A resist composition comprising a salt represented by formula (I) or a resin containing structural units represented by formula (IP). [In the formula, Q1, Q2, R11, and R12 represent H atoms, F atoms, etc., respectively; X1 represents single bonds, -O-, -CO-, etc.; W1 represents single bonds or substituted / unsubstituted cyclic hydrocarbon groups; L1, A1, L10, and L20 represent single bonds or substituted / unsubstituted hydrocarbon groups, respectively; W2 represents a cyclic hydrocarbon group with an I atom, which may also have substituents other than the I atom; R2 represents substituted / unsubstituted hydrocarbon groups; z represents an integer from 0 to 6, mm2 represents an integer from 1 to 5, m3 represents an integer from 0 to 4, mm1 represents 0 or 1, m2 represents 1 or 2, when m2=1, X represents an I atom, when m2=2, X represents an S atom, and two R2s can form a ring together; R3 represents a halogen atom or a substituted / unsubstituted hydrocarbon group; R20 represents H atoms, etc.; X20 represents single bonds, -O-, etc.]