Composition for forming film, method for forming organic film, patterning process, monomer, and polymer

TW202631580APending Publication Date: 2026-08-01SHIN ETSU CHEMICAL CO LTD

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Patent Information

Application Number: TW115113986
Authority / Receiving Office: TW · TW
Patent Type: Applications
Current Assignee / Owner
Priority Date: 2024-08-23
Filing Date: 2025-03-26
Publication Date: 2026-08-01

Application Information

Patent Timeline

23 Aug 2024

Priority

26 Mar 2025

Application

TW115113986

01 Aug 2026

Publication

TW202631580A

IPC: C07C381/00; C08F12/30; C08F20/38; C08F20/54; C08F20/58; C08G8/04; C08G8/08; C08G8/28; C08G65/22; G03F7/004; G03F7/038; G03F7/039; G03F7/11; G03F7/16; G03F7/20; G03F7/32; G03F7/40; H10P76/00

Inventors: 郡大佑; 山本靖之

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Abstract

The present invention is a composition for forming a film including a polymer having an aromatic group having a pentafluorosulfanyl group as a substituent. An object of the present invention is to provide a composition for forming a film that has a less environmental load and excellent coatability on a substrate.

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