Inhibitor composition, inhibitor pattern formation method, compound, and acid generating agent.

TW202631582APending Publication Date: 2026-08-01TOKYO OHKA KOGYO CO LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
TOKYO OHKA KOGYO CO LTD
Filing Date
2025-11-28
Publication Date
2026-08-01
Patent Text Reader

Abstract

[Solution] An inhibitor composition comprising an alkali-soluble resin (A), an acid-generating agent (B), and a crosslinking agent (C), wherein the aforementioned acid-generating agent (B) comprises a compound (B0) represented by the following general formula (b0). In the formula, X0 represents a nitrogen atom or CRX0. Y0 represents a nitrogen atom or CRY0. Z0 represents a nitrogen atom or CRZ0. C represents a carbon atom. RX0, RY0, RZ0, and R0 each independently represent a hydrogen atom or a substituent. Two or more of RX0, RY0, RZ0, and R0 can also be bonded together to form a ring structure. m is an integer of 1 or more, and Mm+ represents a cation with an m valence.
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