Resist composition, laminate and patterning process
TW202631593APending Publication Date: 2026-08-01SHIN ETSU CHEMICAL CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- SHIN ETSU CHEMICAL CO LTD
- Filing Date
- 2025-11-11
- Publication Date
- 2026-08-01
Abstract
carbon atoms and optionally containing a heteroatom. This can provide a non-chemically amplified resist composition excellent in sensitivity and resolvability in photolithography with a high energy line, and a patterning process in which the resist composition is used.
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