Novel compounds, their manufacturing methods and uses
TW202631629APending Publication Date: 2026-08-01SHIN ETSU CHEMICAL CO LTD +1
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- SHIN ETSU CHEMICAL CO LTD
- Filing Date
- 2025-08-19
- Publication Date
- 2026-08-01
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Figure TWG2TA001070276_001 
Figure TWG2TA001070276_002
Abstract
A novel compound and its manufacturing method are provided. The novel compound is a compound with excellent thermal / chemical stability, high carrier mobility, and high solubility in solvents, and is particularly suitable as an organic semiconductor. A compound represented by the following general formula (1). (In general formula (1), R1 and R2 each independently represent a hydrogen atom, a halogen atom, a perfluoroalkyl sulfonyloxy group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group. They may have substituents and may also have the following divalent linkage group A, where divalent linkage group A represents any one or more divalent linkage groups among -O-, -S-, -NR4-, -CO-, -SO-, and -SO2-, and R4 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group).
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