Tin compounds, tin compositions, methods for manufacturing them, resist solutions, patterning methods, thin films, methods for manufacturing patterned thin films and substrates.

TW202631641APending Publication Date: 2026-08-01MITSUBISHI CHEM CORP +1
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-08-30
Publication Date
2026-08-01

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Abstract

This invention provides tin compounds that, through a well-balanced combination of solubility, hydrophobicity, and inhibitor sensitivity, become high-performance inhibitor materials. The tin compounds of this invention have tin atoms, an organic group R, an oxygen ligand, and / or a hydroxyl ligand, and each molecule of the tin compound contains two or more of the aforementioned organic groups R, and contains a Sn-O-Sn structure, wherein the organic group R has 1 to 30 carbon atoms.
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