Substrate with molybdenum film and method for manufacturing the substrate

Abstract

This invention provides a method for manufacturing a substrate having a molybdenum film that suppresses damage to the substrate. The method comprises a film-forming step of supplying a gas containing gaseous MoOF4 and a gas containing a gaseous reducing agent to the substrate, and forming a molybdenum film on the substrate. Regarding the gaseous MoOF4, the partial pressure ratio of gaseous MoF6 (partial pressure of gaseous MoF6 / total partial pressure of gaseous molybdenum precursor) in the total partial pressure of the gaseous molybdenum precursor is 0.008 or less, and the partial pressure ratio of gaseous MoO2F2 (partial pressure of gaseous MoO2F2 / total partial pressure of gaseous molybdenum precursor) is 0.008 or less.

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