Resistor composition, resistor pattern formation method and copolymer

Abstract

This invention relates to an inhibitor composition that generates acid through exposure and alters the solubility of a developer solution through the action of the acid. It contains a resin component (A1) that alters the solubility of the developer solution through the action of the acid. This resin component (A1) contains an inhibitor composition of a copolymer represented by the general formula (A1-0) (where Rc is an ns-valent linkage, ns is an integer of 3 or more, L is a divalent linkage; P is a copolymer portion having: a constituent unit containing an acid-decomposing group whose polarity increases through the action of the acid, a constituent unit that becomes a proton source, and a constituent unit that generates acid through exposure).