Photocurable resin composition, cured material, laminate, manufacturing method of cured material, manufacturing method of laminate, manufacturing method of semiconductor device, and semiconductor device.

TW202631721APending Publication Date: 2026-08-01FUJIFILM CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2026-01-22
Publication Date
2026-08-01
Patent Text Reader

Abstract

The present invention provides a photocurable resin composition, a cured product formed by curing the photocurable resin composition, a laminate containing the cured product, a method for manufacturing the cured product, a method for manufacturing the laminate, a method for manufacturing a semiconductor device including the method for manufacturing the cured product, and a semiconductor device containing the cured product. The photocurable resin composition comprises: a photoradical polymerization initiator having a structure represented by the following formula (A-O); and a resin being at least one of a polyimide having a polymerizable group and a polyimide precursor having a polymerizable group.
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