Resistor materials and pattern formation methods

Abstract

The purpose of this invention is to provide a novel inhibitor material and a method for forming a pattern. The inhibitor material is an inhibitor material containing (A) a polymer and (B) a metal compound. The feature is that the aforementioned component (A) contains a structural unit having fluorine atoms. The aforementioned structural unit having fluorine atoms has a monovalent or divalent aromatic hydrocarbon cyclic group. The aromatic hydrocarbon cyclic group is a group in which at least two or more hydrogen atoms on the aromatic hydrocarbon cyclic group are replaced by fluorine atoms.