Main chain scissionable block copolymers, photoresist compositions including the same, and pattern formation methods
TW202631762APending Publication Date: 2026-08-01DuPont Electronic Materials International LLC
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- DuPont Electronic Materials International LLC
- Filing Date
- 2025-11-06
- Publication Date
- 2026-08-01
Abstract
A block copolymer, comprising a center block comprising an acid-labile group in a backbone of the block copolymer; and at least two copolymer arms covalently attached to the center block, wherein each copolymer arm comprises a first repeating unit, and a second repeating unit that is different from the first repeating unit.
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