Resist composition

Abstract

The present application relates to novel compositions, methods for producing a resist film, methods for producing a resist pattern, methods for producing a processed substrate, methods for producing a device, and uses of the composition thereof. The formulation may exhibit at least one of properties as an advanced material or as a high performance material. The formulation may be used in the nanotechnology process to make semiconductor device / display device application, for example semiconductor chip, or a liquid crystal, quantum dot, OLED display fabricated on a substrate controlled by semiconductors.