Method for manufacturing a protective film forming film and an apparatus for manufacturing a workpiece monolithic material having a protective film.

Abstract

The objective of this invention is to provide a protective film forming film that allows for easy determination of whether a protective film has been heated, and a method for using this protective film forming film to manufacture a monolithic workpiece having a protective film, such as a semiconductor wafer. The solution to the aforementioned objective is a protective film forming film used to adhere to a workpiece and form a protective film. Specifically, when the reflectance of light with a wavelength of 555 nm on the surface of the protective film obtained by forming the protective film is defined as R1 (%), and the reflectance of light with a wavelength of 555 nm on the surface of the protective film after heating it at 220°C for 5 minutes is defined as R2 (%), and the absolute value of the difference between R1 and R2 is defined as RA, RA is 1.0% or higher.

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