Composition and polymer
TW202631875APending Publication Date: 2026-08-01TOKYO OHKA KOGYO CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO OHKA KOGYO CO LTD
- Filing Date
- 2025-12-22
- Publication Date
- 2026-08-01
Abstract
The objective of this invention is to provide a composition and polymer that exhibit good substrate selectivity and can form a polymer brush with good brush density and heat resistance. The solution of this invention is a composition used for selectively modifying a substrate having a surface comprising two or more regions with different materials, comprising a polymer (A) and a solvent (S), wherein the polymer (A) has constituent units derived from styrene and / or constituent units derived from styrene derivatives, and the polymer (A) has a group represented by the following formula (1) at the end of its main chain.
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