Surface treatment agent composition evaporation source
TW202631891APending Publication Date: 2026-08-01SHIN ETSU CHEMICAL CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- SHIN ETSU CHEMICAL CO LTD
- Filing Date
- 2025-09-17
- Publication Date
- 2026-08-01
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Figure TWG2TA001070441_001 
Figure TWG2TA001070441_002
Abstract
By using a surface treatment agent composition evaporation source, a hardened film with improved water repellency, abrasion resistance, and chemical resistance can be formed: a surface treatment agent composition evaporation source having a plurality of pores or voids inside, and having a surface treatment agent composition inside the pores or voids, wherein the surface treatment agent composition is a non-fluorinated organosilicon compound (α) containing at least one linear, branched, or cyclic monovalent hydrocarbon group having at least one carbon atom selected from oxygen, sulfur, nitrogen, and silicon atoms, and a reactive silyl group, and / or a portion thereof, and is composed of a material that does not contain fluorine atoms, and the porosity of the porous body is 0.100 or more and 0.995 or less.
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