Resin composition for forming phase-separated structure, method for producing structure having phase-separated structure, and a block copolymer

Abstract

[Problem] This invention provides a resin composition for forming a phase separation structure, capable of forming a phase separation structure with excellent vertical alignment and etching resistance. [Solution] A resin composition for forming a phase separation structure comprises a block copolymer (A), wherein the block copolymer (A) has blocks (A1), (A2), and (A3) in the following order: block (A1) is composed of a polymer consisting of a repeating structure of structural units represented by formula (a1); block (A2) is composed of a polymer having structural units represented by formula (a2-1); and block (A3) is composed of a random copolymer consisting of a structure in which structural units represented by formula (a3-1) and structural units represented by formula (a3-2) are arranged randomly. In formula (a2-1), Ra21 is a substituent having silicon atoms.

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