Etching solution composition and etching method

Abstract

This invention provides an etching solution composition in one embodiment that can reduce etching unevenness. The invention relates to an etching solution composition for etching a layer containing at least one metal, wherein the etching solution composition contains an etching inhibitor, an acid containing at least nitric acid, and water, with a pH value below 1; the etching inhibitor is selected from at least one nitrogen-containing compound selected from polyalkylimide and polymers containing structural units derived from diallylamine.