Composition and cleaning method for semiconductor cleaning

Abstract

This invention provides a semiconductor cleaning composition that reduces surface corrosion and other damage to the object being treated and efficiently removes contaminants from the surface of the object being treated, as well as a cleaning method using the same. The semiconductor cleaning composition of this invention comprises: compound (A), having at least one group selected from the group consisting of amine groups and their salts, at least one group selected from the group consisting of sulfonyl groups and their salts, and a group having a cyclic structure having 4 to 12 carbon atoms; phosphonic acid (B); and a liquid medium having a pH of 3.0 or higher and 9.0 or lower.

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