Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper

Abstract

The presently claimed invention relates to an alkaline composition for cleaning a substrate comprising i) copper or copper alloy and ii) cobalt or cobalt alloy, the composition comprising: a) at least one pH adjustor selected from diglycolamine, 4,4-diethoxy-N,N-dimethyl-1-butanamine, 3-dimethylaminopropan-1-ol, dimethylaminoethoxyethanol, N,N-dimethylisopropanolamine, ethylethanolamine, N-methyldiethanolamine, 2-(2-(methylamino)ethoxy)ethanol, 3-(methylamino)propane-1,2-diol, 2-[2-[2-(2-methoxy¬ethoxy)ethoxy]ethoxy]ethylamine, 2-[2-(2-aminoethoxy)-ethoxy]-ethanol, N-butyldiethanolamine, diisopropanolamine, N-methyldiisopropanolamine, monoethanolamine, 3-dimethylamino-1,2-propandiol, 2-amino-1-butanol, 2-(2-(2-(2-aminoethoxy)ethoxy)ethoxy)ethanol, prolinol, 1-methyl-2-pyrrolidine¬methanol, 1-methyl-2-pyrrolidinemethanol, 1-methyl-3-pyrrolidinol, 2-amino-2-methyl-1-propanol, N,N-dimethylethanolamine, butylethanolamine, diethylethanolamine, 3-methoxypropylamine, 4-(2-hydroxyethyl)morpholine, 4-(dimethylamino)cyclohexanol, 2-amino-2-methyl-1,3-propanediol, or diisopropylamine; b) at least one complexing agent selected from C2 to