Cleaning agent composition
TW202631976APending Publication Date: 2026-08-01FUJIFILM CORP
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- FUJIFILM CORP
- Filing Date
- 2020-07-14
- Publication Date
- 2026-08-01
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Figure TWG2TA001071896_001 
Figure TWG2TA001071896_002
Abstract
The objective of this invention is to provide a cleaning agent composition for semiconductor devices that exhibits excellent long-term stability in removing organic residues and excellent corrosion resistance to metal layers. The cleaning agent composition of this invention is for semiconductor devices and comprises: one or more hydroxylamine compounds selected from the group consisting of hydroxylamines and hydroxylamine salts; one or more chelating agents selected from the group consisting of carboxylic acid chelating agents (excluding polyaminocarboxylic acids) and phosphonic acid chelating agents; and a benzotriazole compound.
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