Sputter system with magnet motion source

Abstract

A sputter source assembly for a sputter system is disclosed. The sputter source assembly includes a magnetron movable within a reservoir. The sputter source assembly also includes a magnetron actuator having first and second shafts extending along an axis and passing from an interior of the reservoir to an exterior thereof. Further, the magnetron actuator includes first and second motors disposed external to the reservoir and each aligned coaxially with the axis, the first and second motors being arranged to rotatably drive the first and second shafts, respectively, so as to cause movement of the magnetron.

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