Film forming apparatus and film forming method

TW202632034APending Publication Date: 2026-08-01SHIBAURA MECHATRONICS CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-09-23
Publication Date
2026-08-01

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  • Figure TWG2TA001070496_001
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    Figure TWG2TA001070496_003
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Abstract

A film-forming apparatus and method are provided for stable processing in a processing chamber. The film-forming apparatus includes: a chamber; a cover; a target material; a film-forming chamber; a conveying body; a cylindrical section for moving a workpiece holder from the conveying body to a position contacting the cover; an inward flange formed at the lower end of the cylindrical section and extending inward from the lower end; an outward flange disposed inside the cylindrical section and extending outward from the outer side of the cylindrical section, and overlapping the inward flange nearly with the cylindrical section as the cylindrical section moves, suppressing exhaust into the chamber; a lifting mechanism for lifting the cylindrical section relative to the workpiece holder in a contact / separation manner; and an exhaust section disposed at an opening at the bottom of the chamber for vacuum exhaust. The lifting mechanism raises the cylindrical section, bringing the workpiece holder into contact with the lower edge of the cover, and causing the outward flange and the inward flange to nearly overlap. Vacuum exhaust of the processing space of the film-forming chamber is implemented by communicating the interior of the cylindrical section with the exhaust section through a first through hole from the film-forming chamber.
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