Injection gas activation for processing chambers, and related chamber kits, apparatus, and methods

Abstract

The present disclosure relates to injection gas activation, such as for low-temperature processing, and related chamber kits, methods, and processing chambers. In one or more embodiments, a processing chamber includes a chamber body at least partially defining an internal volume. The chamber body includes one or more gas inlet openings. The processing chamber includes a substrate support disposed in the internal volume, one or more heat sources, and a liner disposed at least partially about the internal volume. The processing chamber includes an absorptive mass supported at least partially by the liner between the one or more gas inlet openings and the substrate support.

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