Multiple port gas injection and exhaust for batch substrate processing chamber
TW202632058APending Publication Date: 2026-08-01APPLIED MATERIALS INC
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2025-09-17
- Publication Date
- 2026-08-01
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Figure TWG2TA001070438_001 
Figure TWG2TA001070438_002 
Figure TWG2TA001070438_003
Abstract
Processing chambers having a chamber body with a wafer cassette assembly and at least one lift pin assembly are described. The wafer cassette assembly has at least two support columns configured to hold a plurality of wafer supports spaced along a height of the support columns. The lift pin assemblies have a plurality of lift pins arranged so that each of the plurality of wafer supports comprises at least three lift pins.
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