Epitaxial deposition chamber
TW202632060APending Publication Date: 2026-08-01APPLIED MATERIALS INC
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2022-03-15
- Publication Date
- 2026-08-01
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Figure TWG2TA001071799_001 
Figure TWG2TA001071799_002 
Figure TWG2TA001071799_003
Abstract
A process chamber includes a chamber body having a ceiling disposed above a floor with a chassis and an injector ring disposed therebetween. Upper and lower clamp rings secure the upper and floors, respectively, in place. An upper heating module is coupled to the upper clamp ring above the ceiling. A lower heating module is coupled to the lower clamp ring below the floor.
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