Substrate processing apparatus, substrate processing system, maintenance method and cleaning method

Abstract

An exemplary embodiment of a substrate processing apparatus includes: a chamber; a replaceable part that can be transported between an internal space and the outside of the chamber via an opening; a substrate support disposed in the internal space; a movable part disposed above the substrate support in the internal space and movable in a vertical direction; a lifting mechanism configured to move the movable part in a vertical direction; a plurality of clamps disposed on the movable part and configured to engage with the replaceable part to connect the movable part to the replaceable part; and a support mechanism; wherein the support mechanism includes: a fixed annular member fixed to the substrate support and disposed along the outer periphery of the substrate support; a movable annular member disposed spaced apart from the substrate support and disposed on the fixed annular member; and a tilt adjustment device disposed between the fixed annular member and the movable annular member to adjust the tilt of the movable annular member relative to the fixed annular member.

Images