Plasma-resistant glass, internal components of chambers used in semiconductor manufacturing processes, and methods for manufacturing the same.

Abstract

This invention relates to a plasma-resistant glass, an internal component for a semiconductor manufacturing process, and a method for manufacturing the same. The plasma-resistant glass can be easily melted even when it contains a high content of Si-based oxides, which can minimize the generation of impurities during the etching process and improve etching resistance. none

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