Flow detection method, fluid pump, and a tank-type semiconductor cleaning apparatus

TW202632228APending Publication Date: 2026-08-01BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Filing Date
2026-01-09
Publication Date
2026-08-01

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    Figure TWG2TA001071671_003
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Abstract

The present application discloses a flow detection method, a fluid pump, and a tank-type semiconductor cleaning apparatus, wherein the flow detection method is applied to the fluid pump. The fluid pump comprises a pump housing and two variable-volume chambers and a valve device disposed within the pump housing. The pump housing is provided with an outlet and an inlet. The two variable-volume chambers are each in communication with both the outlet and the inlet via the valve device. The two variable-volume chambers alternately change their volumes, wherein the volume of one chamber increases to allow fluid to enter through the inlet while the volume of the other chamber decreases to discharge the fluid contained therein through the outlet. The flow detection method comprises: detecting the duration during which each of the two variable-volume chambers undergoes a volume change; and calculating the flow rate of the fluid based on the volume of the variable-volume chamber when filled with fluid and the duration of one volume change.
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