Measurement system

TW202632261APending Publication Date: 2026-08-01HITACHI HIGH TECH CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
HITACHI HIGH TECH CORP
Filing Date
2026-01-15
Publication Date
2026-08-01

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Abstract

The present invention aims to provide a technique that enables brightness / contrast adjustment suitable for measurement, even in structures such as semiconductor cross-sections where the shape varies due to material type and multiple regions with different brightness values ​​exist. The measurement system of the present invention generates a luminance histogram of the image in the boundary region of the sample, generates an integrated histogram by integrating the histogram, and sharpens the boundary region by adjusting at least one of the brightness or contrast of the image in a way that flattens the integrated histogram (see Figure 5).
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