Photosensitive resin composition, photosensitive coloring composition, and color filter

TW202632327APending Publication Date: 2026-08-01RESONAC CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
RESONAC CORP
Filing Date
2025-11-03
Publication Date
2026-08-01

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Abstract

A photosensitive resin composition comprising: an alkali-soluble resin (A), a reactive diluent (B), a photopolymerization initiator (C), and a solvent (D), wherein the acid value of the alkali-soluble resin (A) is 10-300 mg KOH / g, the alkali-soluble resin (A) is a resin having a structural unit (a-1) derived from an aromatic ring-containing vinyl unsaturated compound (ma-1), the aromatic ring-containing vinyl unsaturated compound (ma-1) having 1-3 aromatic rings, the refractive index of the homopolymer of the aromatic ring-containing vinyl unsaturated compound (ma-1) being greater than 1.6, and the longest absorption wavelength of the aromatic ring-containing vinyl unsaturated compound (ma-1) not reaching 350 nm.
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