Apparatus, holding device, arrangement, system and method for holding an optical element; lithography system

Abstract

The present invention relates to an apparatus (1) for holding an optical element (2), particularly an optical element of a lithography system or a photomask inspection system, comprising a holding point (3) for connection to the optical element (2), a bracket (4), and a support foot (5). The holding point (3) is connected to the bracket (4). The bracket (4) has at least one rod-shaped foot (6) and a foot joint device (7), wherein the foot joint device (7) is hingedly connected to the lower end (6a) of the rod-shaped foot (6) toward the end away from the holding point (3) to the support foot (5). The present invention provides that the foot joint device (7) has a support joint (7a) and a lateral joint (7b), wherein the support joint (7a) hingedly connects the lower end (6a) of the rod-shaped foot (6) directly to the support foot (5). The invention relates to an apparatus (1) for holding an optical element (2), in particular an optical element of a mask inspection system or of a lithography system, comprising a holding point (3) for connection to the optical element (2), a support (4) and a support foot (5). The holding point (3) is connected to the support (4). The support (4) has at least one rod leg (6) and a foot joint device (7), wherein the foot joint device (7) articulatedly connects a lower end (6a) of the rod leg (6) facing away from the holding point (3) to the support foot (5). The invention provides for the foot joint device (7) to have a supporting joint (7a) and a transverse joint (7b), wherein the supporting joint (7a) articulatedly connects the lower end (6a) of the rod leg (6) directly to the support foot (5).

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