Reflective blank photomask and its manufacturing method

Abstract

[Problem] To provide a reflective blank photomask having auxiliary marks that can be formed by a simple mechanism with less risk of dust generation in a reference mark. [Solution] A reflective blank photomask includes at least: a substrate, a multilayer reflective film disposed on the substrate and reflecting exposure light, and an absorber film disposed on the multilayer reflective film and absorbing the exposure light; a reference mark formed on a surface of the reflective blank photomask on the same side as the multilayer reflective film; the reference mark consists of a main mark serving as a reference position for a defect location and a group of auxiliary marks disposed around the main mark; the group of auxiliary marks consists of a plurality of auxiliary marks, which are spaced apart from each other in a manner that extends in at least one direction from the main mark; the plurality of auxiliary marks are all formed with the same shape and the same orientation.

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