Method and system for pattern coverage determination and pattern selection using diffusion model

Abstract

Described herein is a method and system for pattern coverage determination and pattern selection based on a variance of mask pattern representations generated using a diffusion model. Multiple mask pattern representations are generated for a target pattern representation by inputting multiple noise images to the diffusion model. A variance of the mask pattern representations is computed and represented using a variance map. The variance map may be used for various applications such as determining a pattern coverage of the diffusion model, or for pattern selection process to select a target pattern representation for further training the diffusion model to improve the pattern coverage.

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