Methods and systems for generating photomask pattern data

Abstract

A method for generating photomask pattern data includes a detection data establishment step, a circuit pattern data acquisition step, and a photomask pattern generation step. By pre-establishing pattern pairs consisting of multiple sets of target data and photomask pattern data from the same optical proximity correction model or the same patterning process, and establishing a predetermined relationship from these pattern pairs, a preset circuit pattern data is compared and calculated with the predetermined relationship to generate corresponding photomask pattern data. This method can generate approximately optically compensated photomask pattern data without performing complex optical and mathematical calculations, thus simplifying the photomask pattern data generation process. Furthermore, the present invention also provides a system for performing this method.

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