Imprint apparatus, imprint method, article manufacturing method, and program

Abstract

An imprint apparatus forms a pattern by bringing an imprint material on a partial field of a substrate and a pattern region of a mold into contact with each other and curing the imprint material. The imprint apparatus includes an adjuster configured to adjust a relative position between the substrate and the mold, and a controller configured to control the adjuster so as to bring the imprint material and the pattern region into contact with each other in a state in which the partial field has an offset in an inside direction of the substrate with respect to the pattern region, and then perform alignment between the pattern region and the partial field.

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