Humidification of low gas flows

TW202632429APending Publication Date: 2026-08-01ASML NETHERLANDS BV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ASML NETHERLANDS BV
Filing Date
2025-10-03
Publication Date
2026-08-01

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Abstract

A humidifier device for generating a purge gas for a lithographic apparatus, the device comprising: a first gas inlet configured to receive a first flow of a first gas; a second gas inlet configured to receive a second flow of the first gas; an enricher configured to generate an enriched gas flow comprising the second flow of the first gas and water or hydrogen peroxide; and a mixer configured to mix the first flow of the first gas with an enriched gas derived from the enriched gas flow to generate the purge gas.
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