Field facet mirror for an illumination optics unit for EUV projection lithography

TW202632431APending Publication Date: 2026-08-01CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2025-11-06
Publication Date
2026-08-01

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    Figure TWG2TA001071068_003
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Abstract

for the reflective transfer of the illumination light (16TF) as used illumination light from the light source towards a partial object field portion of the object field that is smaller than the object field. Furthermore, the respective partial field illumination facet
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