Method for operating a microlithographic projection exposure apparatus, and projection exposure apparatus

TW202632432APending Publication Date: 2026-08-01CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2025-11-17
Publication Date
2026-08-01

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Abstract

During an exposure pause between the first exposure phase and the second exposure phase, with the aid of the illumination optical unit
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