Contamination control in an EUV light source

TW202632435APending Publication Date: 2026-08-01ASML NETHERLANDS BV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ASML NETHERLANDS BV
Filing Date
2025-12-05
Publication Date
2026-08-01

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Abstract

A method is performed for controlling contamination in a light source. The method includes: obtaining a reference image of an optical element in the light source; obtaining a real-time image of the optical element; comparing the real-time image with the reference image to determine a contamination metric associated with the optical element; and triggering an operation in the light source based on the determined contamination metric to thereby mitigate contamination at the optical element.
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