Light source using pre-ionization and method of generating extreme ultra-violet light

TW202632437APending Publication Date: 2026-08-01HAMAMATSU PHOTONICS KK +1
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
HAMAMATSU PHOTONICS KK
Filing Date
2024-08-29
Publication Date
2026-08-01

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Abstract

An EUV light source includes a chamber that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma generation region so that the plasma converges in the plasma confinement region. A power delivery section is positioned around the magnetic core. A power supply includes a charging circuit, a pre-ionization circuit, and a solid state switching circuit having an output coupled to the magnetic core. The power supply is configured to isolate the charging circuit from the power delivery section and to generate a pre-ionization pulse through inductive coupling that causes ionization of gas in the plasma generation region. The solid state switching circuit is configured to discharge a capacitance through inductive coupling to form a plasma in the plasma generation region.
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