Processing apparatus, substrate processing apparatus, display method, manufacturing method and process of semiconductor device
TW202632490APending Publication Date: 2026-08-01KOKUSAI DENKI KK
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- KOKUSAI DENKI KK
- Filing Date
- 2025-11-13
- Publication Date
- 2026-08-01
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Abstract
It includes: a display unit capable of displaying an editing screen, which is configured in a table form by defining the conditions of the processing substrate for each of the plurality of steps in a formula, and defining the axis of the aforementioned steps and the axis of the plurality of items constituting the aforementioned conditions, and is configured to allow editing of a plurality of setting values at the intersection of the plurality of items and the plurality of steps; a selection unit capable of selecting a display mode corresponding to the plurality of setting values based on display setting information that sets a display mode for displaying the setting values for each range of the plurality of setting values; and a control unit capable of controlling the aforementioned display unit to display the plurality of setting values in the aforementioned editing screen according to the respective display modes selected by the aforementioned selection unit.
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