Processing apparatus, substrate processing apparatus, display method, manufacturing method and process of semiconductor device

TW202632490APending Publication Date: 2026-08-01KOKUSAI DENKI KK
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
KOKUSAI DENKI KK
Filing Date
2025-11-13
Publication Date
2026-08-01

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Abstract

It includes: a display unit capable of displaying an editing screen, which is configured in a table form by defining the conditions of the processing substrate for each of the plurality of steps in a formula, and defining the axis of the aforementioned steps and the axis of the plurality of items constituting the aforementioned conditions, and is configured to allow editing of a plurality of setting values ​​at the intersection of the plurality of items and the plurality of steps; a selection unit capable of selecting a display mode corresponding to the plurality of setting values ​​based on display setting information that sets a display mode for displaying the setting values ​​for each range of the plurality of setting values; and a control unit capable of controlling the aforementioned display unit to display the plurality of setting values ​​in the aforementioned editing screen according to the respective display modes selected by the aforementioned selection unit.
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