Image measurement method and image processing device

The DETR-based image measurement method addresses stability and accuracy issues in computer vision by automating line segment measurements, enhancing processing speed and flexibility, and reducing operational costs.

TW202632603AActive Publication Date: 2026-08-01MATERIAL ANALYSIS TECH INC
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Patent Information

Application Number
TW114102295
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-01-20
Publication Date
2026-08-01
Estimated Expiration
2045-01-19

AI Technical Summary

Technical Problem

Traditional computer vision techniques struggle with stability and accuracy when processing images with high variability or complex backgrounds, and adjusting measurement targets requires significant time and resources, increasing development costs.

Method used

An image measurement method using a modified DETR architecture that encodes input images and reference line segments into vectors, utilizing a converter encoder and decoder to predict offset results for line segments, enabling automated and accurate measurement.

Benefits of technology

The method improves processing speed and flexibility, reducing operational complexity and costs by automating line segment measurements and adapting to changing requirements without retraining.

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Abstract

The embodiments of the disclosure provide an image measurement method and an image processing device. The method comprises: obtaining an input image and a plurality of reference line segments in the input image; encoding the input image into a sequence vector, and integrating the sequence vector and a positional encoding vector into a first input vector; using a transformer encoder to generate a second input vector based on the first input; using a transformer decoder to generate a predicted offset result corresponding to each of a plurality of to-be-measured line segments based on the second input vector and query information; and generating a measurement result of each to-be-measured line segment based on the predicted offset result of each to-be-measured line segment.
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