Gas supply device and apparatus and method for particle beam-induced processing of a sample

TW202632712APending Publication Date: 2026-08-01CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2025-10-13
Publication Date
2026-08-01

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Abstract

A gas supply device (100) for a device (200) for particle beam-induced processing of a sample (202) includes: a liquid container (102) containing a saturated salt solution (104) for generating a process gas (106) at the surface (108) of the salt solution (104); and a gas feed line (120) connected to the liquid container (102) for transporting gas and for feeding the generated process gas (106) to the operating position (206) of the device (200). A gas supply device (100) for an apparatus (200) for particle beam-induced processing of a sample (202), comprising a liquid container (102) with a saturated salt solution (104) received therein for producing a process gas (106) at a surface (108) of the salt solution (104); and a gas feed line (120) connected to the liquid container (102) for gas transfer and serving to feed the produced process gas (106) to a work location (206) of the apparatus (200).
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