Irradiation device and method for multiple charged particle beams

Abstract

A multi-charged particle beam irradiation apparatus and method are provided to suppress the influence of secondary electrons emitted from a stop aperture substrate on the beam, thereby improving the accuracy of beam irradiation position. According to one aspect of the present invention, the multi-charged particle beam irradiation apparatus comprises: a shielding aperture array substrate for shielding and deflecting each beam of the multi-beam irradiation; an illumination lens for converging the multi-beam irradiation passing through the shielding aperture array substrate to form an intersection point; a stop aperture substrate disposed at the intersection point to shield the beam that has been deflected to a beam-off state; a platform for holding a substrate for irradiation by the beam passing through the stop aperture substrate; an electrostatic deflector disposed close to the stop aperture substrate between the shielding aperture array substrate and the stop aperture substrate; and a voltage control circuit for applying a predetermined voltage to the electrostatic deflector to form an electric field in a direction orthogonal to the orbital center axis of the multi-beam irradiation.

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