Diffusion model in scanning charged-particle microscope image quality enhancement

TW202632721APending Publication Date: 2026-08-01ASML NETHERLANDS BV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-09-22
Publication Date
2026-08-01

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Abstract

An apparatus for determining measurements of a feature on a wafer from a denoised image includes a memory storing a set of instructions and at least one processor configured to execute the set of instructions to cause the apparatus to perform: applying a trained diffusion neural network model to denoise scanning charged-particle microscope (SCPM) images, wherein the trained diffusion neural network model has been trained to denoise a received SCPM image of the wafer; determining an averaged image as an average of the denoised SCPM images; and determining measurements of the feature based on the averaged image.
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