Electrostatic chuck configured to provide consistent clamping force

Abstract

Examples relating to an electrostatic chuck (ESC) for clamping a substrate in a manner that provides consistent radial clamping force across the surface of the substrate are disclosed. In one example, an ESC comprises a substrate-facing surface comprising a plurality of contact features. The contact features are configured to support the substrate. Contact area sizes of at least some contact features of the plurality of contact features vary based at least on locations of the contact features on the substrate-facing surface.

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