System for generating inductively-coupled plasma and method of improving ignition of plasma

TW202632738APending Publication Date: 2026-08-01ASM IP HLDG BV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ASM IP HLDG BV
Filing Date
2025-10-01
Publication Date
2026-08-01

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Abstract

In one embodiment, the present disclosure is directed to a system for generating inductively-coupled plasma. The system includes a dielectric tube and an inductive coil circuit. The inductive coil circuit includes inductive coils surrounding the dielectric tube and connected in series to each other. Intervening capacitors are switchably coupled between the inductive coils. A control circuit is configured to, upon determining a plasma will be ignited, cause at least one of the intervening capacitors to be switched out of the inductive coil circuit during ignition of the plasma.
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