Plasma processing systems with direct current voltage for plasma energy control

Abstract

Methods and apparatus for processing a substrate using a plasma processing system. One example plasma processing system generally includes a first electrode, a second electrode, and a system controller comprising one or more processors and memory that includes computer-executable instructions. The one or more processors are generally configured to execute the computer-executable instructions and cause the plasma processing system to: deliver, using a first radio frequency (RF) generator, a first RF waveform to the first electrode at a first RF frequency, and adjust, using a direct current (DC) supply, a voltage applied to the second electrode during the delivery of the first RF waveform.

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