Arc suppression optimization method

TW202632751APending Publication Date: 2026-08-01SHENZHEN CSL VACUUM SCI & TECH CO LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
SHENZHEN CSL VACUUM SCI & TECH CO LTD
Filing Date
2026-01-23
Publication Date
2026-08-01

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Abstract

An optimized arc suppression method, belonging to the field of arc suppression technology, solves the problem of low arc suppression efficiency in existing plasma cavity systems. The method includes: when an arc is generated, initiating an arc suppression operation; converting the output of the radio frequency (RF) power supply from a constant signal output to a pulse output; and after a preset time, converting the RF power supply output back to a constant signal output. This method achieves a smooth transition in arc suppression, avoids sudden drops in power output, effectively improves the stability and accuracy of arc suppression, and extends the service life of the equipment. Simultaneously, converting the RF power supply output back to a constant signal output after the preset time effectively solves the impact of prolonged arc suppression on the normal operation of the equipment.
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